Statements (51)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
Manufacturing Process
|
| gptkbp:appliesTo |
Substrate
|
| gptkbp:canBeDeployedOn |
Metals
Polymers Semiconductors Nanostructures Dielectrics Carbides Multilayers Nitrides Oxides Sulfides |
| gptkbp:controls |
Film Adhesion
Film Composition Film Microstructure Film Thickness Film Uniformity |
| gptkbp:enables |
Surface Engineering
Miniaturization Functional Coatings |
| gptkbp:hasApplication |
Sensors
Photovoltaics Catalysts Integrated Circuits Magnetic Storage Display Technology Superconductors Protective Coatings Antireflection Coatings Hard Coatings MEMS Devices |
| gptkbp:hasMethod |
gptkb:Atomic_Layer_Deposition
gptkb:Molecular_Beam_Epitaxy gptkb:Physical_Vapor_Deposition Evaporation Chemical Vapor Deposition Electroplating Sputtering Spin Coating |
| https://www.w3.org/2000/01/rdf-schema#label |
Thin Film Deposition
|
| gptkbp:produces |
Thin Film
|
| gptkbp:requires |
Process Control
Vacuum System Source Material |
| gptkbp:usedIn |
gptkb:Semiconductor_Fabrication
Microelectromechanical Systems Optical Coatings Solar Cells |
| gptkbp:bfsParent |
gptkb:Cold-Wall_CVD
gptkb:Hot-Wall_CVD |
| gptkbp:bfsLayer |
7
|