Statements (32)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
thin film deposition technique
|
| gptkbp:abbreviation |
gptkb:PVD
|
| gptkbp:advantage |
high purity films
requires vacuum good adhesion line-of-sight process uniform thickness |
| gptkbp:appliesTo |
gptkb:ceramics
metals polymers |
| gptkbp:category |
materials science
surface engineering |
| gptkbp:discoveredIn |
20th century
|
| https://www.w3.org/2000/01/rdf-schema#label |
Physical Vapor Deposition
|
| gptkbp:involves |
condensation on substrate
vaporization of material |
| gptkbp:method |
gptkb:electron_beam_evaporation
evaporation sputtering arc vapor deposition |
| gptkbp:processor |
vacuum deposition
|
| gptkbp:relatedTo |
Chemical Vapor Deposition
|
| gptkbp:usedFor |
decorative coatings
coating surfaces fabrication of microelectronics tool coatings |
| gptkbp:usedIn |
gptkb:optics
aerospace industry semiconductor industry tool manufacturing |
| gptkbp:bfsParent |
gptkb:Atomic_Layer_Deposition
|
| gptkbp:bfsLayer |
6
|