Statements (26)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:Chemical_Vapor_Deposition_Technique
|
| gptkbp:advantage |
Faster Heating and Cooling
Localized Heating Reduced Contamination |
| gptkbp:contrastsWith |
gptkb:Hot-Wall_CVD
|
| gptkbp:depot |
Metals
Semiconductors Dielectrics |
| gptkbp:feature |
Cool Chamber Walls
Heated Substrate |
| https://www.w3.org/2000/01/rdf-schema#label |
Cold-Wall CVD
|
| gptkbp:limitation |
Complex Equipment Design
Non-uniform Deposition on Large Substrates |
| gptkbp:processor |
gptkb:Plasma-Enhanced_CVD
gptkb:Thermal_CVD |
| gptkbp:requires |
Vacuum System
Gas Precursors Substrate Heater |
| gptkbp:usedFor |
gptkb:Nanomaterial_Synthesis
Epitaxial Growth Microelectronic Devices |
| gptkbp:usedIn |
gptkb:Thin_Film_Deposition
Material Science Semiconductor Manufacturing |
| gptkbp:bfsParent |
gptkb:Chemical_Vapor_Deposition_(CVD)
|
| gptkbp:bfsLayer |
6
|