|
gptkb:total_reflection_XRF_(TXRF)
|
sample deposited on flat carrier
|
|
gptkb:Gas_Chromatography
|
Dissolution
|
|
gptkb:Cryo-Electron_Microscopy
|
vitrification
|
|
gptkb:Gas_Chromatography
|
Filtration
|
|
gptkb:Transmission_Electron_Microscopy
|
staining
|
|
gptkb:Matrix-Assisted_Laser_Desorption/Ionization
|
co-crystallization with matrix
|
|
gptkb:USP_<71>_Sterility_Tests
|
aseptic technique required
|
|
gptkb:FilmArray_System
|
integrated
|
|
gptkb:ASTM_D1002
|
surface preparation specified
|
|
gptkb:Transmission_Electron_Microscopy
|
sectioning
|
|
gptkb:Gas_Chromatography
|
Derivatization
|
|
gptkb:cryo-EM
|
vitrification
|
|
gptkb:Transmission_Electron_Microscopy
|
embedding
|