Statements (35)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
thin film deposition technique
|
| gptkbp:abbreviation |
gptkb:PVD
|
| gptkbp:advantage |
precise thickness control
high purity films good adhesion line-of-sight process limited step coverage requires vacuum equipment |
| https://www.w3.org/2000/01/rdf-schema#label |
physical vapor deposition
|
| gptkbp:includes |
gptkb:electron_beam_evaporation
evaporation sputtering arc vapor deposition |
| gptkbp:inventedBy |
20th century
|
| gptkbp:involves |
condensation on substrate
vaporization of material |
| gptkbp:operatesIn |
vacuum environment
|
| gptkbp:processor |
vacuum deposition
|
| gptkbp:relatedTo |
atomic layer deposition
chemical vapor deposition |
| gptkbp:usedFor |
optical coatings
decorative coatings coating surfaces fabrication of microelectronics tool coatings |
| gptkbp:usedIn |
aerospace industry
semiconductor industry medical devices tool manufacturing optics industry |
| gptkbp:bfsParent |
gptkb:amorphous_semiconductors
gptkb:Atomic_Layer_Deposition_(ALD) gptkb:titanium_nitride gptkb:Low-Density_Amorphous_Carbon |
| gptkbp:bfsLayer |
7
|