Statements (20)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
physical vapor deposition technique
|
| gptkbp:advantage |
high purity films
high deposition rate line-of-sight deposition not suitable for all materials |
| https://www.w3.org/2000/01/rdf-schema#label |
electron beam evaporation
|
| gptkbp:involves |
condensation on substrate
heating material to evaporation |
| gptkbp:processor |
thermal evaporation
|
| gptkbp:relatedTo |
molecular beam epitaxy
sputtering thermal evaporation |
| gptkbp:usedFor |
thin film deposition
|
| gptkbp:usedIn |
semiconductor manufacturing
optical coating |
| gptkbp:uses |
electron beam
vacuum chamber crucible |
| gptkbp:bfsParent |
gptkb:Physical_Vapor_Deposition
|
| gptkbp:bfsLayer |
7
|