X-ray Photoelectron Spectroscopy
GPTKB entity
Statements (57)
Predicate | Object |
---|---|
gptkbp:instanceOf |
analytical technique
surface analysis method |
gptkbp:abbreviation |
gptkb:XPS
|
gptkbp:alsoKnownAs |
gptkb:ESCA
|
gptkbp:analyzes |
top 1-10 nm of material surface
|
gptkbp:awarded |
gptkb:Nobel_Prize_in_Physics_1981_(to_Kai_Siegbahn)
|
gptkbp:detects |
all elements except hydrogen and helium
|
gptkbp:fullName |
gptkb:X-ray_Photoelectron_Spectroscopy
|
https://www.w3.org/2000/01/rdf-schema#label |
X-ray Photoelectron Spectroscopy
|
gptkbp:introducedIn |
1950s
|
gptkbp:inventedBy |
gptkb:Kai_Siegbahn
|
gptkbp:limitation |
cannot detect helium
cannot detect hydrogen charging effects in insulators requires vacuum sample must be solid surface sensitive only |
gptkbp:measures |
binding energy of electrons
kinetic energy of photoelectrons |
gptkbp:non-destructive |
yes
|
gptkbp:output |
XPS spectrum
binding energy peaks |
gptkbp:provides |
empirical formula
elemental composition chemical state of elements electronic state of elements thickness of thin films |
gptkbp:publishedIn |
scientific journals
|
gptkbp:quantitative |
yes
|
gptkbp:relatedTo |
gptkb:Auger_Electron_Spectroscopy
gptkb:Photoelectron_Spectroscopy gptkb:Secondary_Ion_Mass_Spectrometry gptkb:X-ray_Fluorescence |
gptkbp:requires |
ultra-high vacuum
|
gptkbp:standardizedBy |
gptkb:ASTM_E1523
gptkb:ISO_15472 |
gptkbp:type |
gptkb:stone
thin film powder |
gptkbp:usedFor |
chemical analysis
elemental analysis surface composition analysis chemical state analysis |
gptkbp:usedIn |
gptkb:nanotechnology
biomaterials chemistry materials science physics semiconductor industry polymers surface engineering catalysis research thin film analysis corrosion studies |
gptkbp:uses |
gptkb:X-rays
|
gptkbp:bfsParent |
gptkb:Angle-Resolved_Photoemission_Spectroscopy
|
gptkbp:bfsLayer |
6
|