Statements (40)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
surface analysis technique
|
| gptkbp:abbreviation |
gptkb:AES
|
| gptkbp:advantage |
quantitative analysis
high spatial resolution elemental mapping |
| gptkbp:analyzes |
surface layers
|
| gptkbp:basedOn |
gptkb:Auger_effect
|
| gptkbp:combines |
gptkb:Scanning_Electron_Microscopy
Focused Ion Beam |
| gptkbp:commercialized |
1960s
|
| gptkbp:detects |
Auger electrons
|
| gptkbp:discoveredBy |
1925
|
| https://www.w3.org/2000/01/rdf-schema#label |
Auger Electron Spectroscopy
|
| gptkbp:limitation |
surface sensitivity
charging effects on insulators limited detection of light elements |
| gptkbp:measures |
kinetic energy of electrons
|
| gptkbp:namedAfter |
gptkb:Pierre_Auger
|
| gptkbp:output |
Auger spectrum
|
| gptkbp:provides |
elemental composition
chemical state information |
| gptkbp:relatedTo |
gptkb:X-ray_Photoelectron_Spectroscopy
gptkb:Electron_Energy_Loss_Spectroscopy gptkb:Secondary_Ion_Mass_Spectrometry |
| gptkbp:requires |
ultra-high vacuum
conductive sample or coating |
| gptkbp:typicalDepth |
1-10 nanometers
|
| gptkbp:usedFor |
depth profiling
thin film analysis elemental analysis surface chemical analysis |
| gptkbp:usedIn |
gptkb:nanotechnology
materials science semiconductor industry surface engineering corrosion studies |
| gptkbp:uses |
electron beam
X-ray beam |
| gptkbp:bfsParent |
gptkb:X-ray_Photoelectron_Spectroscopy
|
| gptkbp:bfsLayer |
7
|