Statements (15)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
photolithography technique
|
| gptkbp:category |
microfabrication
|
| gptkbp:enables |
feature sizes down to 350 nm
|
| gptkbp:followedBy |
gptkb:g-line_lithography
|
| https://www.w3.org/2000/01/rdf-schema#label |
i-line lithography
|
| gptkbp:introducedIn |
1980s
|
| gptkbp:precededBy |
deep ultraviolet lithography
|
| gptkbp:replacedBy |
KrF excimer laser lithography
|
| gptkbp:usedFor |
integrated circuit fabrication
|
| gptkbp:usedIn |
semiconductor manufacturing
|
| gptkbp:uses |
photoresist
365 nm wavelength light mercury vapor lamp |
| gptkbp:bfsParent |
gptkb:deep_ultraviolet_lithography_(DUV)
|
| gptkbp:bfsLayer |
6
|