Statements (32)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:chemical_compound
|
| gptkbp:appearance |
colorless gas
|
| gptkbp:autoignitionTemperature |
300 °C
|
| gptkbp:boilingPoint |
8.3 °C
|
| gptkbp:CASNumber |
4109-96-0
|
| gptkbp:chemicalFormula |
SiH2Cl2
|
| gptkbp:containsElement |
gptkb:chlorine
hydrogen silicon |
| gptkbp:density |
1.34 g/cm³ (liquid at -110 °C)
|
| https://www.w3.org/2000/01/rdf-schema#label |
dichlorosilane (SiH2Cl2)
|
| gptkbp:IUPACName |
dichlorosilane
|
| gptkbp:meltingPoint |
-122 °C
|
| gptkbp:molecularWeight |
101.01 g/mol
|
| gptkbp:NFPA704 |
Flammability: 4
Instability: 2 Health: 3 |
| gptkbp:productionMethod |
hydrolysis of silicon tetrachloride
reaction of silicon with hydrogen chloride |
| gptkbp:relatedTo |
silane
tetrachlorosilane trichlorosilane |
| gptkbp:riskFactor |
flammable
toxic |
| gptkbp:solubility |
reacts
|
| gptkbp:structure |
tetrahedral geometry
|
| gptkbp:UNNumber |
2189
|
| gptkbp:uses |
semiconductor industry
chemical vapor deposition |
| gptkbp:vaporPressure |
2.46 bar (20 °C)
|
| gptkbp:bfsParent |
gptkb:Low-Pressure_CVD_(LPCVD)
|
| gptkbp:bfsLayer |
7
|