Statements (22)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:company
|
| gptkbp:focusesOn |
process control
thin film metrology wafer inspection |
| gptkbp:foundedYear |
1975
|
| gptkbp:headquartersLocation |
gptkb:Milpitas,_California,_United_States
|
| https://www.w3.org/2000/01/rdf-schema#label |
Nanometrics
|
| gptkbp:industry |
semiconductor equipment
|
| gptkbp:keyPerson |
gptkb:Pierre-Yves_Lesaicherre
|
| gptkbp:mergedInto |
gptkb:Rudolph_Technologies
|
| gptkbp:product |
inspection systems
metrology equipment |
| gptkbp:publiclyTraded |
true
|
| gptkbp:servesIndustry |
semiconductor manufacturing
advanced materials |
| gptkbp:stockExchange |
gptkb:NASDAQ
|
| gptkbp:stockSymbol |
gptkb:NANO
|
| gptkbp:successor |
gptkb:Onto_Innovation
|
| gptkbp:website |
https://www.nanometrics.com/
|
| gptkbp:bfsParent |
gptkb:KLA
gptkb:KLA_Corporation |
| gptkbp:bfsLayer |
6
|