gptkbp:instanceOf
|
gptkb:chemical_compound
|
gptkbp:appearance
|
colorless gas
|
gptkbp:aroma
|
repulsive
|
gptkbp:autoignitionTemperature
|
21 °C
|
gptkbp:boilingPoint
|
-112 °C
|
gptkbp:CASNumber
|
7803-62-5
|
gptkbp:category
|
gptkb:chemical_compound
hydrosilicon compound
silicon hydride
|
gptkbp:chemicalFormula
|
gptkb:SiH4
|
gptkbp:density
|
1.21 g/L (gas at 0 °C, 1 atm)
|
gptkbp:discoveredBy
|
gptkb:Friedrich_Wöhler
|
gptkbp:discoveredIn
|
1857
|
gptkbp:EC_number
|
232-263-4
|
gptkbp:flammability
|
highly flammable
|
https://www.w3.org/2000/01/rdf-schema#label
|
silane (SiH4)
|
gptkbp:IUPACName
|
silane
|
gptkbp:mainGroupElement
|
hydrogen
silicon
|
gptkbp:meltingPoint
|
-185 °C
|
gptkbp:molecularWeight
|
32.117 g/mol
|
gptkbp:precautions
|
keep away from heat/sparks/open flames
store in a well-ventilated place
|
gptkbp:PubChem_CID
|
9622
|
gptkbp:relatedCompounds
|
methane (CH4)
germane (GeH4)
stannane (SnH4)
|
gptkbp:riskFactor
|
H280 (Contains gas under pressure; may explode if heated)
H220 (Extremely flammable gas)
|
gptkbp:solubility
|
reacts
|
gptkbp:structure
|
tetrahedral
|
gptkbp:UNNumber
|
2203
|
gptkbp:uses
|
semiconductor industry
chemical vapor deposition
production of silicon-containing compounds
|
gptkbp:bfsParent
|
gptkb:Silanes
gptkb:Low-Pressure_CVD_(LPCVD)
|
gptkbp:bfsLayer
|
7
|