Statements (23)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
Process
|
| gptkbp:developedBy |
gptkb:Fairchild_Semiconductor
|
| gptkbp:enables |
photolithography
mass production of integrated circuits oxide masking reliable passivation of devices scaling of microelectronic devices transistor isolation |
| https://www.w3.org/2000/01/rdf-schema#label |
planar process
|
| gptkbp:introducedIn |
1959
|
| gptkbp:inventedBy |
gptkb:Jean_Hoerni
|
| gptkbp:replacedBy |
mesa process
|
| gptkbp:step |
gptkb:engraver
doping metallization photolithographic patterning thermal oxidation |
| gptkbp:usedFor |
integrated circuits
MOSFET fabrication planar transistors |
| gptkbp:usedIn |
semiconductor fabrication
|
| gptkbp:bfsParent |
gptkb:Jean_Hoerni
|
| gptkbp:bfsLayer |
5
|