Statements (25)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:technology
|
| gptkbp:appliesTo |
microelectronics
semiconductor manufacturing nanoengineering |
| gptkbp:developedBy |
late 20th century
|
| gptkbp:enables |
creation of nanoribbons
creation of nanowires creation of quantum dots fabrication of nanodevices |
| gptkbp:field |
gptkb:nanotechnology
|
| gptkbp:relatedTo |
microfabrication
top-down fabrication surface patterning |
| gptkbp:requires |
mask or template
resist materials |
| gptkbp:resolution |
sub-100 nanometer scale
|
| gptkbp:technique |
photolithography
electron beam lithography nanoimprint lithography scanning probe lithography |
| gptkbp:usedFor |
patterning nanoscale structures
|
| gptkbp:bfsParent |
gptkb:Atomic_Force_Microscopy
gptkb:scanning_probe_microscopy |
| gptkbp:bfsLayer |
7
|
| https://www.w3.org/2000/01/rdf-schema#label |
nanolithography
|