Statements (48)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:technology
instrumental |
| gptkbp:canBe |
gptkb:engraver
implantation 3D tomography lamella preparation mask repair micro-machining nanopatterning site-specific thinning |
| gptkbp:canBeDeployedOn |
carbon
platinum tungsten |
| gptkbp:canDamage |
sample surface
|
| gptkbp:combines |
scanning electron microscopy
energy-dispersive X-ray spectroscopy electron backscatter diffraction |
| gptkbp:commonIn |
life sciences
materials science semiconductor industry |
| gptkbp:component |
dual-beam system
|
| gptkbp:developedBy |
1970s
|
| gptkbp:enables |
site-specific analysis
site-specific deposition site-specific milling site-specific modification |
| https://www.w3.org/2000/01/rdf-schema#label |
focused ion beam
|
| gptkbp:obtainedFrom |
nanometer resolution
|
| gptkbp:operatesIn |
high voltage
high current low current |
| gptkbp:relatedTo |
gptkb:electron_microscope
electron beam lithography |
| gptkbp:requires |
vacuum environment
|
| gptkbp:usedFor |
imaging
milling deposition material characterization nanofabrication failure analysis sample preparation circuit editing cross-sectioning |
| gptkbp:uses |
ion beam
gallium ions liquid metal ion source |
| gptkbp:bfsParent |
gptkb:electron_microscope
|
| gptkbp:bfsLayer |
5
|