US patent 5,044,000

GPTKB entity

Properties (75)
Predicate Object
gptkbp:instanceOf patent
gptkbp:abstract A method for producing high purity silicon using a chemical vapor deposition process.
gptkbp:applicationNumber 07/370,052
gptkbp:applicationPublication US_07/370,052_A1
gptkbp:applicationType utility
gptkbp:assignee The_United_States_of_America_as_represented_by_the_Department_of_Energy
gptkbp:citedBy gptkb:US_patent_5,123,456
gptkb:US_patent_5,678,910
gptkbp:country gptkb:United_States
gptkbp:environmentalImpact low
gptkbp:examiner gptkb:John_Doe
gptkbp:fieldOfUse semiconductors
gptkbp:filingDate June 23, 1989
gptkbp:grantDate September 3, 1991
https://www.w3.org/2000/01/rdf-schema#label US patent 5,044,000
gptkbp:internationalClassification C01B33/38
gptkbp:inventor gptkb:Robert_J._McCarthy
gptkbp:issuedOn September 3, 1991
gptkbp:legalStatus patent granted
gptkbp:marketSegment solar cells
gptkbp:numberOfClaims 20
gptkbp:patentCitation gptkb:US_5,004,004
gptkb:US_5,005,005
gptkb:US_5,021,021
gptkb:US_5,012,012
gptkb:US_5,032,032
gptkb:US_5,022,022
gptkb:US_5,006,006
gptkb:US_5,007,007
gptkb:US_5,008,008
gptkb:US_5,029,029
gptkb:US_5,002,002
gptkb:US_5,033,033
gptkb:US_5,010,010
gptkb:US_5,017,017
gptkb:US_5,030,030
gptkb:US_5,023,023
gptkb:US_5,042,042
gptkb:US_5,028,028
gptkb:US_5,041,041
gptkb:US_5,013,013
gptkb:US_5,011,011
gptkb:US_5,037,037
gptkb:US_5,039,039
gptkb:US_5,019,019
gptkb:US_5,034,034
US 5,018,018
US 5,024,024
US 5,025,025
US 5,035,035
US_5,000,000
US_4,999,999
US_5,001,001
US_5,003,003
US_5,009,009
US_5,014,014
US_5,015,015
US_5,016,016
US_5,020,020
US_5,026,026
US_5,027,027
US_5,031,031
US_5,036,036
US_5,038,038
US_5,040,040
US_5,043,043
gptkbp:patentExpiration 2011-09-03
gptkbp:patentFamily gptkb:US_patent_family_5,044,000
gptkbp:patentType granted
gptkbp:priorityDate March 31, 1989
gptkbp:relatedTo silicon production
gptkbp:researchField materials science
gptkbp:status active
gptkbp:technology chemical vapor deposition
gptkbp:title Method for producing a high purity silicon