Statements (15)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
semiconductor process node
|
| gptkbp:announced |
2022
|
| gptkbp:basedOn |
gptkb:TSMC_N5_process
|
| gptkbp:commercialProduction |
2022
|
| gptkbp:developedBy |
gptkb:TSMC
|
| gptkbp:feature |
higher transistor density than N5
improved performance over N5 lower power consumption than N5 uses EUV lithography |
| https://www.w3.org/2000/01/rdf-schema#label |
TSMC 4NP
|
| gptkbp:targetMarket |
mobile devices
high performance computing |
| gptkbp:technology |
4nm
|
| gptkbp:bfsParent |
gptkb:Nvidia_Blackwell
|
| gptkbp:bfsLayer |
6
|