Statements (35)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
epoxy-based negative photoresist
|
| gptkbp:alternativeTo |
AZ photoresist
KMPR photoresist |
| gptkbp:component |
bisphenol A novolac epoxy resin
|
| gptkbp:crosslinkedBy |
acid-catalyzed reaction
|
| gptkbp:curedBy |
UV light
|
| gptkbp:developedBy |
gptkb:Shell_Chemicals
propylene glycol monomethyl ether acetate (PGMEA) |
| gptkbp:feature |
mechanical strength
chemical resistance high aspect ratio structures high resolution patterning optical transparency thick film capability |
| https://www.w3.org/2000/01/rdf-schema#label |
SU-8
|
| gptkbp:introducedIn |
1980s
|
| gptkbp:marketedAs |
Kayaku Advanced Materials
MicroChem |
| gptkbp:removes |
piranha solution
plasma ashing solvent stripping (difficult) |
| gptkbp:riskFactor |
eye irritant
skin sensitizer |
| gptkbp:solvent |
gamma-butyrolactone
cyclopentanone |
| gptkbp:storage |
cool, dry place
|
| gptkbp:substrate |
gptkb:glass
metal silicon |
| gptkbp:usedFor |
lithography
microfluidics microfabrication MEMS fabrication |
| gptkbp:bfsParent |
gptkb:LIGA_process
|
| gptkbp:bfsLayer |
8
|