Physical Vapor Deposition (PVD)
GPTKB entity
Statements (32)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
thin film deposition technique
|
| gptkbp:advantage |
environmentally friendly
requires vacuum good adhesion high purity coatings limited coating thickness |
| gptkbp:appliesTo |
gptkb:ceramics
gptkb:glass metals plastics |
| https://www.w3.org/2000/01/rdf-schema#label |
Physical Vapor Deposition (PVD)
|
| gptkbp:includes |
evaporation
sputtering arc vapor deposition |
| gptkbp:inventedBy |
20th century
|
| gptkbp:involves |
condensation on substrate
material vaporization |
| gptkbp:operatesIn |
vacuum environment
|
| gptkbp:processor |
vacuum deposition
|
| gptkbp:produces |
thin films
coatings |
| gptkbp:relatedTo |
gptkb:Chemical_Vapor_Deposition_(CVD)
|
| gptkbp:usedFor |
semiconductor fabrication
decorative coatings tool coating coating surfaces |
| gptkbp:usedIn |
gptkb:jewelry
gptkb:optics microelectronics cutting tools |
| gptkbp:bfsParent |
gptkb:Chemical_Vapor_Deposition_(CVD)
|
| gptkbp:bfsLayer |
6
|