Focused Ion Beam (FIB) systems

GPTKB entity

Statements (63)
Predicate Object
gptkbp:instanceOf Ion beam technology
gptkbp:allows 3D imaging
gptkbp:canCreate Nanostructures
gptkbp:developedBy Research institutions
gptkbp:firstIntroduced 1970s
gptkbp:hasCapital Ion implantation
gptkbp:hasEvents High spatial resolution
https://www.w3.org/2000/01/rdf-schema#label Focused Ion Beam (FIB) systems
gptkbp:is_studied_in Microstructures
gptkbp:is_used_in Semiconductor industry
gptkbp:isAvenueFor Biotechnology
Metrology
gptkbp:isBeneficialFor Nanotechnology
gptkbp:isCelebratedFor X-ray microscopy
gptkbp:isCompatibleWith Various materials
gptkbp:isCriticizedFor Failure analysis
Device optimization
gptkbp:isEnhancedBy Software algorithms
Advanced optics
gptkbp:isEvaluatedBy Performance metrics
gptkbp:isFacilitatedBy Computer software
gptkbp:isImportantFor Quality control
gptkbp:isIncorporatedIn Integrated circuits
Research equipment
gptkbp:isIntegratedWith Automated systems
gptkbp:isInvolvedIn Device fabrication
Research applications
gptkbp:isOrganizedBy Trained personnel
gptkbp:isPartOf Research laboratories
Advanced manufacturing processes
Nanofabrication tools
Microfabrication processes
gptkbp:isSubjectTo Regulatory standards
Ion beam damage
gptkbp:isUsedBy Modify surfaces
gptkbp:isUsedFor gptkb:Scanning_Electron_Microscopy_(SEM)
Material properties
Sample analysis
Defect repair
Device structures
gptkbp:isUsedIn Research and development
Academic research
Electronics manufacturing
Material characterization
gptkbp:isUtilizedFor Microelectronic devices
Material behavior
Thin film analysis
Prototype_development
gptkbp:isUtilizedIn Material science
Surface engineering
gptkbp:isVisitedBy Material type
High precision tasks
gptkbp:keyIssues Failure analysis
Nanostructure fabrication
gptkbp:mayHave Deposition
Milling
gptkbp:operatesIn Solid materials
gptkbp:requires Vacuum environment
gptkbp:usedFor Sample preparation
Material analysis
Nanofabrication
Circuit editing
gptkbp:utilizes Ion beams