|
gptkbp:instanceOf
|
gptkb:chemical_compound
|
|
gptkbp:appearance
|
colorless gas
|
|
gptkbp:autoignitionTemperature
|
not flammable
|
|
gptkbp:boilingPoint
|
17.1 °C
|
|
gptkbp:CASNumber
|
7783-82-6
|
|
gptkbp:chemicalFormula
|
gptkb:WF6
|
|
gptkbp:containsElement
|
tungsten
fluorine
|
|
gptkbp:decaysTo
|
gptkb:tungsten(V)_fluoride
fluorine gas
|
|
gptkbp:density
|
3.44 g/L (gas at 15 °C)
|
|
gptkbp:GHS_signal_word
|
Danger
|
|
https://www.w3.org/2000/01/rdf-schema#label
|
tungsten hexafluoride
|
|
gptkbp:IUPACName
|
gptkb:tungsten(VI)_fluoride
|
|
gptkbp:meltingPoint
|
2.3 °C
|
|
gptkbp:molecularWeight
|
297.83 g/mol
|
|
gptkbp:oxidation_state_of_tungsten
|
+6
|
|
gptkbp:producedBy
|
direct fluorination of tungsten
|
|
gptkbp:refractiveIndex
|
1.0006 (gas)
|
|
gptkbp:riskFactor
|
toxic
corrosive
|
|
gptkbp:solubility
|
reacts
|
|
gptkbp:structure
|
octahedral geometry
|
|
gptkbp:type
|
gptkb:water
alkali metals
ammonia
|
|
gptkbp:UNNumber
|
2196
|
|
gptkbp:uses
|
semiconductor industry
chemical vapor deposition of tungsten
|
|
gptkbp:vaporPressure
|
16.6 kPa (at 20 °C)
|
|
gptkbp:bfsParent
|
gptkb:WF6
|
|
gptkbp:bfsLayer
|
7
|