Statements (22)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
optics manufacturer
|
| gptkbp:collaboratesWith |
gptkb:Trumpf
gptkb:Fraunhofer_Institute |
| gptkbp:founded |
1969
|
| https://www.w3.org/2000/01/rdf-schema#label |
Zeiss lithography optics
|
| gptkbp:location |
gptkb:Oberkochen,_Germany
|
| gptkbp:notableFor |
extreme precision
nanometer-scale accuracy |
| gptkbp:parentCompany |
gptkb:Carl_Zeiss_AG
|
| gptkbp:partOf |
gptkb:Carl_Zeiss_AG
|
| gptkbp:productType |
high-precision optical systems
lenses for DUV mirrors for EUV projection optics |
| gptkbp:supplies |
gptkb:ASML
|
| gptkbp:usedIn |
semiconductor manufacturing
photolithography EUV lithography DUV lithography |
| gptkbp:website |
https://www.zeiss.com/semiconductor-manufacturing-technology/int/home.html
|
| gptkbp:bfsParent |
gptkb:Zeiss
|
| gptkbp:bfsLayer |
5
|