Statements (32)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:vacuum
|
| gptkbp:abbreviation |
gptkb:UHV
|
| gptkbp:definedIn |
vacuum with pressures lower than about 10^-7 pascal
|
| gptkbp:measures |
cold cathode gauge
ionization gauge |
| gptkbp:minimumPressure |
10^-7 to 10^-10 pascal
below 10^-7 pascal |
| gptkbp:notableAchievement |
pumping systems
bake-out procedures |
| gptkbp:relatedTo |
High Vacuum
Extreme High Vacuum Vacuum technology |
| gptkbp:requires |
careful cleaning
leak-tight systems low outgassing materials low vapor pressure materials metal seals minimal virtual leaks ultra-clean environment |
| gptkbp:usedFor |
gptkb:X-ray_photoelectron_spectroscopy
mass spectrometry thin film deposition ion implantation studying surface reactions |
| gptkbp:usedIn |
gptkb:particle_accelerators
surface science semiconductor manufacturing electron microscopy synchrotron light sources |
| gptkbp:bfsParent |
gptkb:Vacuum_Technique
|
| gptkbp:bfsLayer |
8
|
| https://www.w3.org/2000/01/rdf-schema#label |
Ultra-High Vacuum
|