US patent family 5,678,011
GPTKB entity
Properties (47)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
patent
|
| gptkbp:covers |
semiconductor manufacturing processes
|
| gptkbp:hasAbstract |
A method for producing a semiconductor device that improves performance.
|
| gptkbp:hasApplicationNumber |
08/740,123
|
| gptkbp:hasAssignee |
gptkb:Tech_Innovations_Inc.
|
| gptkbp:hasCitations |
gptkb:US_patent_5,456,789
gptkb:US_patent_5,123,456 gptkb:US_patent_5,234,567 gptkb:US_patent_5,345,678 |
| gptkbp:hasClaim |
3. The method of claim 1, further comprising a step of doping.
4. The method of claim 1, wherein the substrate is silicon. 2. The method of claim 1, wherein the device is a transistor. 1. A method for producing a semiconductor device. 5. The method of claim 1, wherein the process is a chemical vapor deposition. |
| gptkbp:hasCountry |
gptkb:United_States
|
| gptkbp:hasFieldOfUse |
artificial intelligence
telecommunications renewable energy biotechnology consumer electronics electronics medical devices robotics defense technology integrated circuits nanotechnology computing devices smart devices automotive electronics optoelectronics aerospace technology microelectronics energy systems |
| gptkbp:hasFilingDate |
1996-10-31
|
| gptkbp:hasInventor |
gptkb:John_Doe
|
| gptkbp:hasLegalStatus |
active
|
| gptkbp:hasPatentNumber |
5,678,011
|
| gptkbp:hasPriorityDate |
1995-10-31
|
| gptkbp:hasPublications |
1997-10-14
|
| gptkbp:hasRelatedPatent |
gptkb:US_patent_family_5,678,015
gptkb:US_patent_family_5,678,012 gptkb:US_patent_family_5,678,014 gptkb:US_patent_family_5,678,013 |
| gptkbp:hasTitle |
Method for producing a semiconductor device
|
| https://www.w3.org/2000/01/rdf-schema#label |
US patent family 5,678,011
|
| gptkbp:isCitedBy |
gptkb:US_patent_6,123,456
|
| gptkbp:isPartOf |
US_patent_system
|