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gptkbp:instanceOf
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patent
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gptkbp:abstract
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A method for producing high purity silicon using a chemical vapor deposition process.
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gptkbp:applicationNumber
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08/174,198
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gptkbp:applicationType
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non-provisional
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gptkbp:assignee
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The_United_States_of_America_as_represented_by_the_Department_of_Energy
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gptkbp:citedBy
|
gptkb:US_patent_6,123,123
gptkb:US_patent_8,234,567
gptkb:US_patent_7,123,456
gptkb:US_patent_9,345,678
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gptkbp:country
|
gptkb:United_States
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gptkbp:documentType
|
patent document
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|
gptkbp:examiner
|
gptkb:John_Doe
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gptkbp:expirationDate
|
September 6, 2011
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|
gptkbp:fieldOfUse
|
semiconductors
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|
gptkbp:filedIn
|
gptkb:Robert_J._McCarthy
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gptkbp:grantDate
|
September 6, 1994
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|
https://www.w3.org/2000/01/rdf-schema#label
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US patent 5,345,000
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gptkbp:internationalClassification
|
C01B33/38
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gptkbp:inventor
|
gptkb:Robert_J._McCarthy
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gptkbp:issuedOn
|
September 6, 1994
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gptkbp:language
|
English
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|
gptkbp:numberOfClaims
|
20
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|
gptkbp:patentCitation
|
gptkb:US_patent_5,456,789
gptkb:US_patent_5,567,890
gptkb:US_patent_5,890,123
gptkb:US_patent_5,678,901
gptkb:US_patent_5,123,456
gptkb:US_patent_5,234,567
gptkb:US_patent_5,012,345
gptkb:US_patent_5,345,678
gptkb:US_patent_5,789,012
US patent 5,901,234
|
|
gptkbp:patentFamily
|
US_patent_family
|
|
gptkbp:patentType
|
utility patent
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|
gptkbp:priorityDate
|
March 31, 1993
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|
gptkbp:relatedTo
|
chemical vapor deposition
high purity materials
silicon purification
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gptkbp:status
|
active
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|
gptkbp:title
|
Method for producing a high purity silicon
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gptkbp:USClassification
|
423/1.1
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