Properties (15)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
patent
|
| gptkbp:abstract |
A method for producing high purity silicon using a chemical vapor deposition process.
|
| gptkbp:applicationNumber |
07/407,052
|
| gptkbp:assignee |
The_United_States_of_America_as_represented_by_the_Department_of_Energy
|
| gptkbp:citedBy |
gptkb:US_patent_5,456,789
gptkb:US_patent_5,123,999 gptkb:US_patent_5,678,901 gptkb:US_patent_5,234,123 gptkb:US_patent_5,345,678 |
| gptkbp:fieldOfUse |
semiconductors
|
| https://www.w3.org/2000/01/rdf-schema#label |
US patent 5,027,000
|
| gptkbp:inventor |
gptkb:Robert_J._McCarthy
|
| gptkbp:issuedOn |
June 25, 1991
|
| gptkbp:priorityDate |
March 30, 1989
|
| gptkbp:title |
Method for producing a high purity silicon
|