Statements (13)
Predicate | Object |
---|---|
gptkbp:instanceOf |
gptkb:US_patent
|
gptkbp:allows |
A method for producing a semiconductor device with improved reliability by forming an insulating film on a semiconductor substrate and then forming a conductive film thereon.
|
gptkbp:application |
US 05/747,222
|
gptkbp:assignee |
gptkb:Sony_Corporation
|
gptkbp:country |
gptkb:United_States
|
gptkbp:filingDate |
1976-12-13
|
https://www.w3.org/2000/01/rdf-schema#label |
US Patent 4101963A
|
gptkbp:inventedBy |
gptkb:Masaru_Ibuka
|
gptkbp:publicationDate |
1978-07-18
|
gptkbp:status |
expired
|
gptkbp:title |
Method for producing a semiconductor device
|
gptkbp:bfsParent |
gptkb:Don_Lancaster
|
gptkbp:bfsLayer |
8
|