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gptkbp:instanceOf
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patent
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gptkbp:abstract
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A method and apparatus for producing a high density plasma.
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gptkbp:applicationDate
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April 15, 1985
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gptkbp:applicationNumber
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06/823,198
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gptkbp:applicationType
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non-provisional
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gptkbp:assignee
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gptkb:McDonald_Technologies,_Inc.
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gptkbp:citedBy
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gptkb:US_Patent_5,000,000
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gptkbp:country
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gptkb:United_States
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gptkbp:documentType
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patent document
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gptkbp:examiner
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gptkb:John_Smith
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gptkbp:fieldOfUse
|
plasma technology
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gptkbp:filedIn
|
gptkb:Robert_H._McDonald
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gptkbp:grantDate
|
July 15, 1986
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https://www.w3.org/2000/01/rdf-schema#label
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US Patent 4,600,002
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gptkbp:internationalClassification
|
H01J37/32
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gptkbp:inventor
|
gptkb:Robert_H._McDonald
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gptkbp:inventorCountry
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gptkb:United_States
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gptkbp:issuedOn
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July 15, 1986
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gptkbp:language
|
English
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gptkbp:legalStatus
|
expired
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gptkbp:numberOfClaims
|
20
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gptkbp:patentAbstract
|
Describes a method for generating high density plasma.
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gptkbp:patentCitation
|
cited by 10 other patents.
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gptkbp:patentClaim
|
20 claims.
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gptkbp:patentDescription
|
Detailed description of the invention.
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gptkbp:patentExpiration
|
July 15, 2006
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gptkbp:patentFamily
|
US_Patent_4,600,002_family
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gptkbp:patentImage
|
link to patent image.
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gptkbp:patentLink
|
https://patents.google.com/patent/US4600002A/en
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gptkbp:patentNumber
|
4,600,002
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gptkbp:patentOffice
|
gptkb:USPTO
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gptkbp:patentType
|
utility patent
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gptkbp:priorityDate
|
April 15, 1985
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gptkbp:relatedTo
|
semiconductor manufacturing
plasma etching
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gptkbp:status
|
granted
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gptkbp:title
|
Method and apparatus for producing a high density plasma
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gptkbp:USClassification
|
118/724
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