US 34,555,741 B2

GPTKB entity

Properties (57)
Predicate Object
gptkbp:instanceOf patent
gptkbp:hasAbstract This patent describes a method for enhancing the performance of semiconductor devices.
gptkbp:hasApplicationNumber 15/634,123
gptkbp:hasAssignee gptkb:XYZ_Corporation
gptkbp:hasCategories semiconductor fabrication
gptkbp:hasCitedPatent gptkb:US_34,555,742_B2
gptkbp:hasClaim 20
gptkbp:hasCollaboratedWith research institutions
gptkbp:hasCollaborationsWith XYZ_Corporation_and_ABC_University
gptkbp:hasCountry gptkb:US
gptkbp:hasDeveloped commercialized
gptkbp:hasExaminer Jane_Smith
gptkbp:hasFieldOfUse electronics
semiconductor technology
gptkbp:hasFilingDate 2017-05-01
gptkbp:hasFilm global
gptkbp:hasFunding gptkb:National_Science_Foundation
grants
gptkbp:hasGoals technology
gptkbp:hasImpactOn improved efficiency
gptkbp:hasInternationalClassification H01L
gptkbp:hasInventor gptkb:John_Doe
gptkbp:hasLegalStatus gptkb:XYZ_Corporation
Active
licensed
gptkbp:hasOccupation FDA_approved
gptkbp:hasPartnershipsWith gptkb:XYZ_Corporation
commercialized
gptkbp:hasPatentNumber 34,555,741
gptkbp:hasPriorityDate 2016-05-01
2019-11-26
2037-05-01
gptkbp:hasPublications 2019-11-26
gptkbp:hasRelatedPatent gptkb:US_34,555,740_B2
transistors
process innovation
utility patent
gptkbp:hasResearchInterest gptkb:ABC_University
advanced materials
nanotechnology
chemical vapor deposition
semiconductor physics
gptkbp:hasSpecialty patent
gptkbp:hasTechnicalField material science
gptkbp:hasTechnology enhanced performance
scalability
electronics manufacturing
gptkbp:hasTitle Method for enhancing the performance of a semiconductor device
gptkbp:hasTouristAttraction silicon
https://www.w3.org/2000/01/rdf-schema#label US 34,555,741 B2
gptkbp:isCitedBy gptkb:US_34,555,742_B2
gptkbp:isFiledIn gptkb:United_States
gptkbp:isGranted true
gptkbp:isPartOf patent family
gptkbp:isRelatedTo gptkb:US_34,555,740_B2
gptkbp:market consumer electronics
semiconductor market