Properties (63)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
patent
|
| gptkbp:communityFeedback |
Positive feedback from industry experts.
|
| gptkbp:hasAbstract |
This patent describes a method for improving semiconductor device performance.
|
| gptkbp:hasApplicationNumber |
30/111,110
|
| gptkbp:hasAssignee |
gptkb:Tech_Innovations_LLC
|
| gptkbp:hasCitations |
gptkb:US_10,123,456_B2
|
| gptkbp:hasClaim |
20
|
| gptkbp:hasClient |
Electronics manufacturers.
|
| gptkbp:hasCollaboratedWith |
University_of_Technology.
|
| gptkbp:hasCompetitors |
Competing patents.
|
| gptkbp:hasCountry |
gptkb:US
gptkb:USA |
| gptkbp:hasDescription |
A detailed description of the method and its applications.
|
| gptkbp:hasDeveloped |
Commercialization.
|
| gptkbp:hasExaminer |
Jane_Smith
|
| gptkbp:hasFacility |
A novel method to enhance performance.
US_30,111,110 |
| gptkbp:hasFeature |
Paid
Promising growth potential. |
| gptkbp:hasFieldOfUse |
consumer electronics
electronics |
| gptkbp:hasFigures |
5
|
| gptkbp:hasFilingDate |
2020-01-15
2021-06-15 |
| gptkbp:hasFunding |
Government grant.
|
| gptkbp:hasGoals |
International markets.
Transformative for semiconductor manufacturing. |
| gptkbp:hasImpactOn |
Improved efficiency in electronic devices.
|
| gptkbp:hasInternationalClassification |
H01L
|
| gptkbp:hasInventor |
gptkb:John_Doe
|
| gptkbp:hasLanguage |
gptkb:New_York
|
| gptkbp:hasLegalStatus |
Active
Available for licensing. |
| gptkbp:hasOccupation |
Compliant.
|
| gptkbp:hasPartnershipsWith |
Achieved significant sales.
Partnerships with manufacturers. ElectroTech_Corp. |
| gptkbp:hasPriorityDate |
2019-01-15
|
| gptkbp:hasPublications |
A7
2021-07-01 |
| gptkbp:hasRelatedPatent |
gptkb:Tech_Innovations_LLC
Utility Process innovation. US_30/111,111 |
| gptkbp:hasResearchInterest |
Material science.
Further optimization of the method. Institute_of_Advanced_Technology. |
| gptkbp:hasResidence |
gptkb:San_Francisco
|
| gptkbp:hasSpecialty |
Protected_under_US_patent_law.
|
| gptkbp:hasSustainabilityInitiatives |
Reduced waste in semiconductor production.
|
| gptkbp:hasTechnicalField |
semiconductor fabrication
|
| gptkbp:hasTechnology |
Performance degradation in semiconductor devices.
Detailed specifications provided. Scalability of the method. |
| gptkbp:hasTitle |
Method for enhancing the performance of a semiconductor device
|
| https://www.w3.org/2000/01/rdf-schema#label |
US 30,111,110 A7
|
| gptkbp:isCitedBy |
US_30,222,222_A1
|
| gptkbp:isFiledIn |
gptkb:United_States
|
| gptkbp:isPublishedIn |
gptkb:United_States_Patent_and_Trademark_Office
|
| gptkbp:isRelatedTo |
semiconductor technology
|
| gptkbp:market |
High-performance computing.
Semiconductor industry. Growing demand for high-performance devices. |