|
gptkbp:instanceOf
|
patent
|
|
gptkbp:communityFeedback
|
Positive.
|
|
gptkbp:environmentalImpact
|
Low
|
|
gptkbp:hasAbstract
|
This patent describes a method for improving the efficiency of semiconductor devices.
|
|
gptkbp:hasApplicationNumber
|
US_13/170,123
|
|
gptkbp:hasArtwork
|
Further optimization of methods.
|
|
gptkbp:hasAssignee
|
gptkb:Tech_Innovations_LLC
|
|
gptkbp:hasCitations
|
US 9876543210 B2
|
|
gptkbp:hasClaim
|
20
|
|
gptkbp:hasClient
|
Manufacturers.
|
|
gptkbp:hasCollaborationsWith
|
gptkb:University_of_Technology
|
|
gptkbp:hasCompetitors
|
Unique methodology.
|
|
gptkbp:hasContribution
|
Global.
Online.
|
|
gptkbp:hasCountry
|
gptkb:US
|
|
gptkbp:hasDescription
|
A method to enhance the performance of semiconductor devices by optimizing material properties.
|
|
gptkbp:hasDeveloped
|
Commercialization
|
|
gptkbp:hasExaminer
|
Jane_Smith
|
|
gptkbp:hasExhibition
|
Acquisition.
|
|
gptkbp:hasFacility
|
Addressed.
|
|
gptkbp:hasFeature
|
Promising.
Implemented.
|
|
gptkbp:hasFieldOfUse
|
Consumer electronics
Electrical engineering
Microelectronics
|
|
gptkbp:hasFigures
|
3
|
|
gptkbp:hasFilingDate
|
2011-06-30
|
|
gptkbp:hasFunding
|
High.
Series A.
Government_Grant
|
|
gptkbp:hasGoals
|
Granted
International.
|
|
gptkbp:hasImpactOn
|
Positive.
High-performance devices
|
|
gptkbp:hasInternationalClassification
|
H01L
|
|
gptkbp:hasInventor
|
gptkb:Alice_Johnson
gptkb:John_Doe
|
|
gptkbp:hasKeywords
|
semiconductor, performance, method
|
|
gptkbp:hasLanguage
|
English
|
|
gptkbp:hasLegalStatus
|
Active
|
|
gptkbp:hasMember
|
Yes
|
|
gptkbp:hasOccupation
|
Yes
Active.
|
|
gptkbp:hasPartnershipsWith
|
gptkb:Tech_Solutions_Inc.
Smartphones
Research institutions.
Partnerships.
|
|
gptkbp:hasPriorityDate
|
2010-06-30
2023-01-01
|
|
gptkbp:hasPrograms
|
Provided.
Industry experts.
|
|
gptkbp:hasPublications
|
C1
2012-10-02
|
|
gptkbp:hasPublicTransport
|
24/7.
|
|
gptkbp:hasRelatedPatent
|
Developed.
US_1234567890_A1
|
|
gptkbp:hasResearchInterest
|
gptkb:Institute_of_Advanced_Materials
Nanotechnology
Conducted.
Chemical_vapor_deposition
|
|
gptkbp:hasService
|
Available.
|
|
gptkbp:hasSibling
|
Licensing.
|
|
gptkbp:hasSpecialty
|
Protected.
Completed.
|
|
gptkbp:hasSustainabilityInitiatives
|
Incorporated.
|
|
gptkbp:hasTechnicalField
|
Semiconductor devices
|
|
gptkbp:hasTechnology
|
Improved efficiency
Ongoing.
Material stability.
|
|
gptkbp:hasTheme
|
Tech companies.
|
|
gptkbp:hasTitle
|
Method for enhancing the performance of a semiconductor device
|
|
gptkbp:hasTouristAttraction
|
Silicon
|
|
gptkbp:hasVariants
|
New semiconductor materials
|
|
https://www.w3.org/2000/01/rdf-schema#label
|
US 2425263768 C1
|
|
gptkbp:isCitedBy
|
5
|
|
gptkbp:isFiledIn
|
gptkb:United_States
|
|
gptkbp:isGranted
|
gptkb:United_States_Patent_and_Trademark_Office
|
|
gptkbp:isRelatedTo
|
semiconductor technology
|
|
gptkbp:market
|
High
Electronics industry
Direct sales.
Growing demand for efficient devices.
|
|
gptkbp:pageCount
|
15
|