Properties (47)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
patent
|
| gptkbp:hasAbstract |
This patent describes a method for enhancing the performance of semiconductor devices.
|
| gptkbp:hasApplicationNumber |
16/123,456
|
| gptkbp:hasAssignee |
gptkb:Tech_Innovations_LLC
|
| gptkbp:hasCitedPatent |
US_20,000,000_A1
|
| gptkbp:hasClaim |
20
dependent claim independent claim |
| gptkbp:hasCountry |
gptkb:USA
|
| gptkbp:hasCPCClassification |
H01L29/00
|
| gptkbp:hasDescription |
The invention relates to semiconductor devices and methods for their fabrication.
|
| gptkbp:hasExaminer |
Jane_Smith
|
| gptkbp:hasFacility |
US_21,555,579_C1_family
|
| gptkbp:hasFieldOfUse |
electrical engineering
electronics microelectronics |
| gptkbp:hasFigures |
5
|
| gptkbp:hasFilingDate |
2020-06-15
2021-10-12 |
| gptkbp:hasGoals |
chemical vapor deposition
|
| gptkbp:hasImpactOn |
high-performance devices
|
| gptkbp:hasInternationalClassification |
H01L
|
| gptkbp:hasInventor |
gptkb:John_Doe
|
| gptkbp:hasKeywords |
semiconductor, performance, enhancement
|
| gptkbp:hasLegalEvent |
patent granted
|
| gptkbp:hasLegalStatus |
active
granted |
| gptkbp:hasPriorityDate |
2019-06-15
|
| gptkbp:hasPublications |
B1
2021-11-02 21,555,579 C1 |
| gptkbp:hasRelatedPatent |
gptkb:US_21,555,578_B1
process innovation utility patent non-provisional |
| gptkbp:hasResearchInterest |
material science
|
| gptkbp:hasTechnicalField |
semiconductor devices
|
| gptkbp:hasTechnology |
improved efficiency
enhanced semiconductor performance. |
| gptkbp:hasTitle |
Method for enhancing the performance of a semiconductor device
|
| gptkbp:hasTouristAttraction |
silicon
|
| https://www.w3.org/2000/01/rdf-schema#label |
US 21,555,579 C1
|
| gptkbp:isCitedBy |
US_21,000,000_B2
|
| gptkbp:isFiledIn |
gptkb:United_States
|
| gptkbp:isGranted |
true
|
| gptkbp:isPartOf |
US_patent_system
|
| gptkbp:isRelatedTo |
semiconductor technology
|