Statements (14)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:US_patent
|
| gptkbp:allows |
A method for producing a semiconductor device with improved characteristics by forming a silicon oxide film on a silicon substrate and then forming a silicon nitride film thereon.
|
| gptkbp:application |
US 05/407,073
|
| gptkbp:assignee |
gptkb:Sony_Corporation
|
| gptkbp:country |
gptkb:United_States
|
| gptkbp:filingDate |
1973-10-19
|
| gptkbp:inventedBy |
gptkb:Masaru_Ibuka
|
| gptkbp:priorityDate |
1972-10-20
|
| gptkbp:publicationDate |
1976-01-20
|
| gptkbp:status |
Expired
|
| gptkbp:title |
Method for producing a semiconductor device
|
| gptkbp:bfsParent |
gptkb:John_Alex_Atalla
|
| gptkbp:bfsLayer |
7
|
| https://www.w3.org/2000/01/rdf-schema#label |
US3934233A
|