Statements (27)
| Predicate | Object |
|---|---|
| gptkbp:instance_of |
gptkb:conference
|
| gptkbp:attendees |
gptkb:engineers
gptkb:scientists gptkb:researchers |
| gptkbp:collaboration |
gptkb:private_sector
government agencies academic institutions |
| gptkbp:exhibitor |
technology companies
|
| gptkbp:first_held |
gptkb:2000
|
| gptkbp:focus |
gptkb:lithography
|
| gptkbp:frequency |
annual
|
| gptkbp:has_publications |
presented
|
| https://www.w3.org/2000/01/rdf-schema#label |
SPIE Advanced Lithography
|
| gptkbp:location |
gptkb:San_Jose,_California
|
| gptkbp:network |
yes
|
| gptkbp:notable_speakers |
industry leaders
|
| gptkbp:offers_workshops_on |
yes
|
| gptkbp:organizer |
gptkb:SPIE
|
| gptkbp:publication |
gptkb:Proceedings_of_SPIE
|
| gptkbp:topics |
metrology
photolithography process control extreme ultraviolet lithography mask technology |
| gptkbp:tutorials |
yes
|
| gptkbp:bfsParent |
gptkb:SPIE
|
| gptkbp:bfsLayer |
7
|