|
gptkbp:instance_of
|
gptkb:academic_journals
|
|
gptkbp:abbreviation
|
JVST
|
|
gptkbp:access
|
no
|
|
gptkbp:affiliated_with
|
gptkb:American_Vacuum_Society
|
|
gptkbp:archives
|
Portico
|
|
gptkbp:capacity
|
60
|
|
gptkbp:editor
|
gptkb:John_Smith
|
|
gptkbp:editorial_focus
|
gptkb:New_York,_USA
international
|
|
gptkbp:established
|
gptkb:1964
|
|
gptkbp:focuses_on
|
vacuum science
|
|
gptkbp:frequency
|
monthly
|
|
gptkbp:h_index
|
gptkb:30
|
|
gptkbp:has_color
|
gptkb:Google_Scholar
gptkb:Scopus
gptkb:Web_of_Science
Chemical Abstracts
Inspec
|
|
https://www.w3.org/2000/01/rdf-schema#label
|
Journal of Vacuum Science & Technology
|
|
gptkbp:impact
|
2.5
|
|
gptkbp:is_adopted_by
|
25%
|
|
gptkbp:is_cited_in
|
gptkb:APA
1500
|
|
gptkbp:issn
|
0734-2101
|
|
gptkbp:issues
|
gptkb:5
|
|
gptkbp:language
|
English
|
|
gptkbp:page_range
|
A1-A10
|
|
gptkbp:published_by
|
gptkb:American_Vacuum_Society
|
|
gptkbp:research_areas
|
gptkb:optics
materials science
semiconductors
surface engineering
vacuum technology
|
|
gptkbp:reviews
|
double-blind
|
|
gptkbp:topics
|
gptkb:nanotechnology
thin films
surface science
plasma processing
|
|
gptkbp:type
|
peer-reviewed
|
|
gptkbp:type_of
|
gptkb:letters
research articles
review articles
technical notes
|
|
gptkbp:website
|
https://avs.scitation.org/journal/jva
|
|
gptkbp:wins
|
online
|
|
gptkbp:bfsParent
|
gptkb:Mats_W._Hultman
|
|
gptkbp:bfsLayer
|
6
|