Intel's 10nm process technology
GPTKB entity
Statements (14)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:Company
|
| gptkbp:competesWith |
gptkb:TSMC's_7nm_process_technology
Samsung's_8nm_process_technology |
| gptkbp:developedBy |
gptkb:Intel_Corporation
|
| gptkbp:features |
enhanced performance
higher transistor density improved power efficiency |
| https://www.w3.org/2000/01/rdf-schema#label |
Intel's 10nm process technology
|
| gptkbp:introduced |
2018
|
| gptkbp:predecessor |
gptkb:Intel's_7nm_process_technology
|
| gptkbp:produces |
Silicon_wafers
|
| gptkbp:successor |
gptkb:Intel's_14nm_process_technology
|
| gptkbp:usedIn |
gptkb:Intel_Core_processors
|
| gptkbp:utilizes |
Extreme Ultraviolet Lithography (EUV)
|