Statements (49)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
Laser
|
| gptkbp:application |
gptkb:Laser_Surgery
Microfabrication Photolithography Laser Ablation |
| gptkbp:benefits |
High Cost
Environmental Concerns Limited Lifespan Requires Specialized Training Complex Operation |
| gptkbp:characteristics |
High Precision
Short Pulse Duration High Repetition Rate Low Thermal Damage Non-thermal Ablation Wide Range of Wavelengths High_Peak_Power |
| gptkbp:coolingSystem |
Water Cooling
|
| gptkbp:duration |
Nanoseconds
|
| gptkbp:energyEfficiency |
Low Efficiency
|
| gptkbp:fuelType |
gptkb:Argon
gptkb:Krypton Neon Xenon |
| gptkbp:future_plans |
Increased Efficiency
Miniaturization New Applications Improved Safety Features Integration with Other Technologies |
| https://www.w3.org/2000/01/rdf-schema#label |
Excimer Laser
|
| gptkbp:inventor |
1970s
|
| gptkbp:maintenance |
Regular Maintenance Required
|
| gptkbp:marketedAs |
Surface Treatment
Semiconductor Manufacturing Laser Marking Eye Surgery Laser Etching |
| gptkbp:powerOutput |
High Power
Electrical_Discharge |
| gptkbp:produces |
gptkb:IBM
Ultraviolet Light |
| gptkbp:range |
193 nm to 351 nm
|
| gptkbp:research_areas |
Biomedical Engineering
Material Science Optoelectronics Plasma_Physics |
| gptkbp:safety |
Eye Protection Required
|
| gptkbp:type |
Gas Laser
|
| gptkbp:uses |
Gases
|