Statements (13)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
gptkb:company
|
| gptkbp:acquiredBy |
gptkb:Applied_Materials
|
| gptkbp:acquisitionYear |
2000
|
| gptkbp:country |
gptkb:United_States
|
| gptkbp:foundedYear |
1970
|
| gptkbp:headquartersLocation |
gptkb:Hayward,_California,_United_States
|
| https://www.w3.org/2000/01/rdf-schema#label |
Etec Systems
|
| gptkbp:industry |
semiconductor equipment
|
| gptkbp:notableProduct |
electron beam lithography systems
mask pattern generators |
| gptkbp:status |
defunct
|
| gptkbp:bfsParent |
gptkb:Applied_Materials
|
| gptkbp:bfsLayer |
6
|