Triple
T28731086
| Position | Surface form | Disambiguated ID | Type / Status |
|---|---|---|---|
| Subject | EUV pellicle |
E730662
|
entity |
| Predicate | instanceOf |
P0
|
FINISHED |
| Object | lithography component |
C8467
|
CONCEPT FINISHED |
How this triple was built (1 step)
Every LLM step that produced this triple, in pipeline order — named-entity classification, the disambiguation choices (the exact options shown, with the pick highlighted), and the generated description. The batch + timestamp of each is in the Provenance table below.
CD
Concept disambiguation
gpt-5-mini-2025-08-07
Target class: lithography component Context triple: [EUV pellicle, instanceOf, lithography component]
-
A.
optical component
chosen
An optical component is a physical element designed to manipulate light—such as by transmitting, reflecting, refracting, focusing, or filtering it—within an optical system.
-
B.
scanning probe lithography technique
A scanning probe lithography technique is a nanofabrication method that uses a sharp, movable probe to directly pattern surfaces with high spatial resolution through mechanical, thermal, electrical, or chemical interactions.
-
C.
lithographic print
A lithographic print is an image produced by transferring ink from a flat, chemically treated stone or metal plate onto paper, typically in multiple copies.
-
D.
semiconductor manufacturing facility
A semiconductor manufacturing facility is a highly controlled industrial plant where raw silicon wafers are processed through complex, precise, and cleanroom-based fabrication steps to produce integrated circuits and microchips.
-
E.
photographic film manufacturing operation
A photographic film manufacturing operation is an industrial process that produces light-sensitive film by coating flexible substrates with photographic emulsions, then drying, cutting, and packaging them for use in imaging applications.
- F. None of above.
Provenance (1 batch)
The batch behind each pipeline step, in order, with when it ran. Timestamps are batch-level — stages were processed in waves, so the object chain (NER → NED1 → NEDg → NED2) reads in order, but predicate / elicitation batches can sit in a different wave.
| Step | Stage | Batch ID | Status | When |
|---|---|---|---|---|
| creating | Elicitation | batch_69f043eae0908190b28ce314686247d7 |
completed | April 28, 2026, 5:21 a.m. |
Created at: April 28, 2026, 5:58 a.m.