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gptkbp:instanceOf
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patent
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gptkbp:hasAbstract
|
This patent describes a method for improving the efficiency of semiconductor devices.
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gptkbp:hasApplicationNumber
|
10/123,456
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gptkbp:hasAssignee
|
gptkb:Tech_Innovations_Inc.
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gptkbp:hasClaim
|
20
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gptkbp:hasContent
|
123 Tech Lane, Silicon Valley, CA
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gptkbp:hasCountry
|
gptkb:United_States
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gptkbp:hasExaminer
|
Jane_Smith
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gptkbp:hasFieldOfUse
|
consumer electronics
electronics
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gptkbp:hasFilingDate
|
2004-02-06
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gptkbp:hasFunding
|
gptkb:National_Science_Foundation
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gptkbp:hasImpactOn
|
economic growth
innovation
job creation
semiconductor industry
technology advancement
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gptkbp:hasInternationalClassification
|
H01L 21/00
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gptkbp:hasInventor
|
gptkb:Alice_Johnson
gptkb:John_Doe
|
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gptkbp:hasLegalStatus
|
active
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gptkbp:hasPatentNumber
|
6789540
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gptkbp:hasPerformance
|
efficiency
cost-effectiveness
yield
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|
gptkbp:hasPriorityDate
|
2004-09-14
2003-02-06
|
|
gptkbp:hasPrograms
|
etching
annealing
doping
deposition
|
|
gptkbp:hasPublications
|
2004-0123456 A1
|
|
gptkbp:hasRelatedPatent
|
gptkb:US_6,789,541_K30
utility
|
|
gptkbp:hasResearchInterest
|
chemical vapor deposition
|
|
gptkbp:hasResidence
|
gptkb:California
|
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gptkbp:hasTechnicalField
|
semiconductor manufacturing
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gptkbp:hasTechnology
|
performance enhancement
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|
gptkbp:hasTitle
|
Method for enhancing the performance of a semiconductor device
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|
gptkbp:hasTouristAttraction
|
silicon
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|
https://www.w3.org/2000/01/rdf-schema#label
|
US 6,789,540 K29
|
|
gptkbp:isAssignedTo
|
gptkb:Tech_Innovations_Inc.
|
|
gptkbp:isCitedBy
|
gptkb:US_7,123,456_B2
|
|
gptkbp:isFiledIn
|
gptkb:United_States
|
|
gptkbp:isFiledUnder
|
utility patent
|
|
gptkbp:isPartOf
|
patent family
|
|
gptkbp:isPublishedIn
|
USPTO database
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|
gptkbp:isRelatedTo
|
semiconductor technology
|