gptkbp:instanceOf
|
patent
|
gptkbp:covers
|
semiconductor technology
|
gptkbp:environmentalImpact
|
low
|
gptkbp:hasAbstract
|
A method for improving semiconductor device performance through novel material application.
|
gptkbp:hasApplicationNumber
|
16/123,456
|
gptkbp:hasAssignee
|
gptkb:Tech_Innovations_LLC
|
gptkbp:hasCitedPatent
|
US_24,500,000_A1
|
gptkbp:hasClaim
|
20
|
gptkbp:hasCollaborationsWith
|
gptkb:University_of_Technology
|
gptkbp:hasCountry
|
gptkb:USA
gptkb:United_States
|
gptkbp:hasDescription
|
This patent describes a method for enhancing the performance of semiconductor devices.
|
gptkbp:hasDeveloped
|
commercialization
|
gptkbp:hasExaminer
|
Jane_Smith
|
gptkbp:hasFieldOfUse
|
telecommunications
consumer electronics
electronics
|
gptkbp:hasFilingDate
|
2021-05-15
|
gptkbp:hasFunding
|
government grant
|
gptkbp:hasGoals
|
5
granted
chemical vapor deposition
|
gptkbp:hasImpactOn
|
high
high-performance devices
|
gptkbp:hasInternationalClassification
|
H01L
|
gptkbp:hasInventor
|
gptkb:John_Doe
|
gptkbp:hasLegalEvent
|
patent granted
|
gptkbp:hasLegalStatus
|
active
patented
|
gptkbp:hasPartnershipsWith
|
electronics manufacturing
|
gptkbp:hasPriorityDate
|
2020-05-15
|
gptkbp:hasPublications
|
A1
2022-11-10
|
gptkbp:hasRelatedPatent
|
gptkb:US_24,900,035_A1
process innovation
utility
|
gptkbp:hasResearchInterest
|
gptkb:Institute_of_Advanced_Materials
nanotechnology
improving material properties
|
gptkbp:hasTechnicalField
|
material science
|
gptkbp:hasTechnology
|
yes
increased efficiency
semiconductor fabrication
|
gptkbp:hasTitle
|
Method for enhancing the performance of a semiconductor device
|
gptkbp:hasTouristAttraction
|
silicon
|
https://www.w3.org/2000/01/rdf-schema#label
|
US 24,900,034 A1
|
gptkbp:isCitedBy
|
US_25,000,001_A1
|
gptkbp:isFiledIn
|
gptkb:United_States
|
gptkbp:isFiledUnder
|
utility patent
|
gptkbp:isPartOf
|
patent family
|
gptkbp:isPublishedIn
|
USPTO database
|
gptkbp:isRelatedTo
|
US_24,900,033_A1
|
gptkbp:market
|
smartphones
global electronics market
|