US 24,900,034 A1

GPTKB entity

Statements (54)
Predicate Object
gptkbp:instanceOf patent
gptkbp:covers semiconductor technology
gptkbp:environmentalImpact low
gptkbp:hasAbstract A method for improving semiconductor device performance through novel material application.
gptkbp:hasApplicationNumber 16/123,456
gptkbp:hasAssignee gptkb:Tech_Innovations_LLC
gptkbp:hasCitedPatent US_24,500,000_A1
gptkbp:hasClaim 20
gptkbp:hasCollaborationsWith gptkb:University_of_Technology
gptkbp:hasCountry gptkb:USA
gptkb:United_States
gptkbp:hasDescription This patent describes a method for enhancing the performance of semiconductor devices.
gptkbp:hasDeveloped commercialization
gptkbp:hasExaminer Jane_Smith
gptkbp:hasFieldOfUse telecommunications
consumer electronics
electronics
gptkbp:hasFilingDate 2021-05-15
gptkbp:hasFunding government grant
gptkbp:hasGoals 5
granted
chemical vapor deposition
gptkbp:hasImpactOn high
high-performance devices
gptkbp:hasInternationalClassification H01L
gptkbp:hasInventor gptkb:John_Doe
gptkbp:hasLegalEvent patent granted
gptkbp:hasLegalStatus active
patented
gptkbp:hasPartnershipsWith electronics manufacturing
gptkbp:hasPriorityDate 2020-05-15
gptkbp:hasPublications A1
2022-11-10
gptkbp:hasRelatedPatent gptkb:US_24,900,035_A1
process innovation
utility
gptkbp:hasResearchInterest gptkb:Institute_of_Advanced_Materials
nanotechnology
improving material properties
gptkbp:hasTechnicalField material science
gptkbp:hasTechnology yes
increased efficiency
semiconductor fabrication
gptkbp:hasTitle Method for enhancing the performance of a semiconductor device
gptkbp:hasTouristAttraction silicon
https://www.w3.org/2000/01/rdf-schema#label US 24,900,034 A1
gptkbp:isCitedBy US_25,000,001_A1
gptkbp:isFiledIn gptkb:United_States
gptkbp:isFiledUnder utility patent
gptkbp:isPartOf patent family
gptkbp:isPublishedIn USPTO database
gptkbp:isRelatedTo US_24,900,033_A1
gptkbp:market smartphones
global electronics market