Statements (61)
| Predicate | Object |
|---|---|
| gptkbp:instanceOf |
lithography
|
| gptkbp:appliesTo |
nanostructures
|
| gptkbp:completed |
sub-10 nm resolution
|
| gptkbp:createdBy |
3D structures
|
| gptkbp:developedBy |
gptkb:Harold_G._Craighead
|
| gptkbp:enables |
high-resolution patterning
|
| gptkbp:has |
high throughput
|
| gptkbp:hasDepartment |
material constraints
alignment accuracy mold fabrication |
| https://www.w3.org/2000/01/rdf-schema#label |
Nanoimprint lithography
|
| gptkbp:influenced |
pressure
temperature viscosity mold design |
| gptkbp:involves |
UV curing
thermal imprinting |
| gptkbp:is |
cost-effective
environmentally friendly used in electronics used in sensors a promising technology a direct patterning technique a maskless lithography technique a scalable process used in data storage used in optics |
| gptkbp:is_a_time_for |
3D printing
wearable technology advanced materials sensors and actuators solar cells energy harvesting nanophotonics high-performance devices smart materials surface modification nanomedicine light-emitting devices nanoelectronics flexible electronics nanobiotechnology low-cost manufacturing creating nanostructures fabricating patterns functional surfaces high-density patterning pattern transfer producing features replicating nanostructures template-based fabrication quantum_devices |
| gptkbp:is_used_in |
MEMS
photonics biomedical applications microfluidics NEMS |
| gptkbp:relatedTo |
photolithography
|
| gptkbp:requires |
high precision
|
| gptkbp:usedIn |
semiconductor manufacturing
|
| gptkbp:utilizes |
molds
|