Intel 10nm Super Fin technology
GPTKB entity
Statements (22)
| Predicate | Object |
|---|---|
| gptkbp:instance_of |
gptkb:Company
|
| gptkbp:bfsLayer |
5
|
| gptkbp:bfsParent |
gptkb:Intel_Iris_Xe_graphics_family
gptkb:Golden_Cove_microarchitecture gptkb:Intel_Iris_Xe_graphics |
| gptkbp:based_on |
Super Fin architecture
|
| gptkbp:competes_with |
7nm technology
|
| gptkbp:developed_by |
gptkb:Intel_Corporation
|
| gptkbp:enables |
higher transistor density
|
| gptkbp:enhances |
gptkb:benchmark
|
| gptkbp:features |
gptkb:Fin_FET_transistors
|
| https://www.w3.org/2000/01/rdf-schema#label |
Intel 10nm Super Fin technology
|
| gptkbp:improves |
power efficiency
thermal performance |
| gptkbp:introduced |
gptkb:2019
|
| gptkbp:is_part_of |
Intel's process technology roadmap
|
| gptkbp:manufacturer |
Extreme Ultraviolet Lithography (EUV)
|
| gptkbp:reduces |
die size
|
| gptkbp:successor |
14nm technology
|
| gptkbp:supports |
AI workloads
|
| gptkbp:targets |
high-performance computing
|
| gptkbp:used_in |
gptkb:microprocessor
|